{"id":301478,"date":"2019-01-21T15:25:15","date_gmt":"2019-01-21T14:25:15","guid":{"rendered":"https:\/\/www.deltamicroscopies.com\/produit\/silicon-nitride-lift-out-tem-windows-with-gold-contacts\/"},"modified":"2023-10-27T11:28:50","modified_gmt":"2023-10-27T10:28:50","slug":"silicon-nitride-lift-out-tem-windows-with-gold-contacts","status":"publish","type":"product","link":"https:\/\/www.deltamicroscopies.com\/en\/products\/silicon-nitride-lift-out-tem-windows-with-gold-contacts\/","title":{"rendered":"Silicon Nitride Lift-Out TEM Windows with gold contacts"},"content":{"rendered":"

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DESCRIPTION<\/strong><\/p>\n

Silicon Nitride (SiN) Half-Grids For Lift-Out Applications <\/strong>
\n100 micron thick frame, fits flip-stage SEM\/FIB and standard TEM sample holders<\/strong>
\n– 400 nm thick low-stress Silicon Nitride film
\n– (1) 100 x 500 micron window with the free-edge along length
\n– 200 nm thick gold contacts for in situ sample electrical biasing<\/p>\n

What’s NEW?
\nOur Silicon Nitride Lift-Out TEM Windows feature a large, robust window with a freely suspended side along one length of the window, providing an easily accessed edge for sample preparation and thinning. As part of sample preparation, the low-stress Silicon Nitride can be thinned by focused-ion beam to electron transparent thickness (e.g. 50 nm or less). To prevent charging during sample preparation, we recommend coating the underside of Lift-Out TEM Windows with ~5 nm amorphous carbon by placing the grids face-down (vs. as packaged) onto cleanroom paper while in a standard carbon evaporator.<\/p>\n

100% Satisfaction Guaranteed<\/p>\n

LIFT-OUT GRIDS
\nLow-stress silicon nitride for lift-out applications<\/p>\n