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EDX-Checker LE-10 with BN, C, PTFE, Mn, Co and Al/Cu as reference materials, AISI 316L… Show more (+) EDX-Checker LE-10 with BN, C, PTFE, Mn, Co and Al/Cu as reference materials, AISI 316L for quantitative analysis check and a 400mesh Nickel grid for quick magnification calibration and mapping check. Show less (-) |
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EDX-Checker S8 with C, PTFE, Mn, Co and Al/Cu as reference materials, AISI 316L for… Show more (+) EDX-Checker S8 with C, PTFE, Mn, Co and Al/Cu as reference materials, AISI 316L for quantitative analysis check and Ni grids with 400 plus 1000 mesh for quick magnification calibration and mapping check. Show less (-) |
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Solid, round and stabile EM-Tec PS22 preparation station for all types and sizes of SEM… Show more (+) Solid, round and stabile EM-Tec PS22 preparation station for all types and sizes of SEM pin stubs and Hitachi 15mm cylinder stubs Show less (-) |
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EM-Tec PS27 pin stub dual slot vise with two slots of 7 mm wide. Ideal… Show more (+) EM-Tec PS27 pin stub dual slot vise with two slots of 7 mm wide. Ideal for holding thin wafer pieces samples for cross section imaging or other thin samples. Samples are clamped by set screws. Holder size w/o pin is Ø25x7.2mm. Show less (-) |
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Technical Data Sheet : Evaporated Aluminum On 3mm Grid |
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Evaporated Pt/Ir on Holey carbon film. Holey carbon film support provides holes for ease of… Show more (+) Evaporated Pt/Ir on Holey carbon film. Holey carbon film support provides holes for ease of focus and astigmatism correction. The dots of evaporated Pt/Ir provide dense particles for resolution checks through the particle seperation test.
Technical Data Sheet: Evaporated Platinum Iridium in Holey Carbon Film for Point Separation Resolution Test
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Technical Data Sheet : Diffraction Standard Evaporated Thallous Chloride on 3mm Grid |
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Resolution of the quad structure of this molecule indicates an instrument resolution better than 1… Show more (+) Resolution of the quad structure of this molecule indicates an instrument resolution better than 1.25nm with a photomicrograph negative magnification of at least 100,000x.
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