Silicon Dioxide 40nm thick TEM Windows ( 9 Windows)

REF: SO100-A40Q33 Categories: , ,

Description

SILICON DIOXIDE TEM WINDOW GRIDS
20 nm and 40 nm

 

 

DESCRIPTION

Silicon Oxide TEM Windows
100 micron thick frame, fits 3 mm sample holders
40 nm thick Silicon Oxide film
Dimensions: Nine windows: (8) 100 x 100 micron squares, (1) 100 x 350 micron square. Guaranteed Intact
Non-Porous

Improved Grid Shape
We have re-engineered our TEM grids so that they are easier to handle. By making the grids slightly narrower users now have easy access to grids in TEM holders. No more fumbling with tweezers while trying to pick up or put down grids. The new TEMWindow grid shape is still compatible with all standard holders.

100% Satisfaction Guaranteed

Note: Non-Porous films are lightly wrinkled with approximately 5 microns or less deflection across 100 microns of travel. This is typically not problematic for high-resolution Imaging.

 

TEM Windows handling Instructions

Explore how the Technical Properties Technical Properties  of SiMPore’s Pure Silicon windows compare to other thin films
For examples of how these TEM windows can be used, please see Featured Publications

Competitively Priced: state of the art manufacturing processes and an expert engineering team allow us to offer Silicon Dioxide solutions at competitive prices
Plasma Cleanable: Silicon dioxide window grids can be vigorously plasma cleaned to remove organic contamination, unlike carbon grids
Increased Uniformity: reduced field-to-field variability
Tolerates temperatures >1000C: supports use in environmental TEMs where dynamic processes are observed at high températures
Withstands harsh deposition & chemical conditions: provides an ideal balance of imaging resolution and mechanical strength
Incorporates stoichiometric silicon dioxide: offers the ability to analyze for nitrogen by EDX techniques

 

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