NANOPOUROS Silicon Nitride TEM Window (Single 500 micron window)

REF: SN100-P20Q05 Categories: , ,


5 nm, 10 nm, 20 nm, 50 nm, and MICROPOROUS


SiMPore’s NANOPOROUS Silicon Nitride TEM Windows
– Nanoporous Amorphous film
– 100 micron thick frame, fits 3 mm sample holders
– Dimensions: (1) 500 x 500 micron window
– 20 nm thick low-stress silicon nitride
– Average pore diameter is 30 nm and porosity is ~25%

What’s NEW?

Suspend nanoparticles in background-free environments. Our new Nanoporous Silicon Nitride grids allow imaging of particles that span pores averaging 30 nm in width.

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View the TEMwindows Silicon_Nitride brochure

TEM Windows handling Instructions

Explore how the Technical Properties of SiMPore’s Silicon Nitride films compare to other thin films

For examples of how these Silicon Nitride TEM windows can be used, please see Featuread Publications

– Competitively Priced: state of the art manufacturing processes and an expert engineering team allow us to offer Silicon Nitride solutions at competitive prices
– Plasma Cleanable: Silicon nitride grids can be vigorously plasma cleaned to remove organic contamination, unlike carbon grids
– Increased Uniformity: reduced field-to-field variability
– Tolerates temperatures >1000C: supports use in environmental TEMs where dynamic processes are observed at high temperatures
– Withstands harsh deposition & chemical conditions: provides an ideal balance of imaging resolution and mechanical strength
– Incorporates LPCVD, low-stress (~250MPa), non-stoichiometric silicon nitride: provides flat, insulating and hydrophobic surfaces




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