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Description
Additional information
| Primary Application | Electron Microscopy |
|---|---|
| Secondary Applications | Cryo-EM, High-resolution EM, Sample Deposition |
| Material | Nanoporous Silicon Nitride, Silicon Nitride |
| Thickness | 5 nm, 10 nm, 20 nm, 50 nm |
| Porosity | Nanoporous, Nonporous |
| Window Size | (8) 50×50 µm + (1) 50×100 µm, (8) 100×100 µm + (1) 100×350 µm, (8) 250×250 µm + (1) 250×500 µm |
| Pore Size | 30 nm |
| Chip Frame | 2.9 mm diameter + 0.1 mm thick, 2.9 mm hexagonal + 0.1 mm thick |
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